Function Panel and Manufacturing Method Thereof

ABSTRACT

A novel functional panel is provided. The functional panel includes a first substrate, a second substrate, a first layer, a second layer, a sealing portion, and a first adhesive layer. The sealing portion is between the first layer and the second layer. The first adhesive layer is between the first layer and the first substrate. The second substrate is in contact with the second layer. When a surface of the first layer which faces the first substrate is referred to as a first surface and a surface of the second layer which is in contact with the second substrate is referred to as a second surface, the functional panel has a plurality of regions having different distances between the first surface and the second surface.

BACKGROUND OF THE INVENTION

1. Field of the Invention

One embodiment of the present invention relates to a functional panel, adevice, or a data processor.

Note that one embodiment of the present invention is not limited to theabove technical field. Examples of the technical field of one embodimentof the present invention include a semiconductor device, a displaydevice, a light-emitting device, a power storage device, a memorydevice, a method for driving any of them, and a method for manufacturingany of them.

2. Description of the Related Art

In recent years, a flexible device in which a functional element such asa semiconductor element, a display element, or a light-emitting elementis provided over a substrate having flexibility (hereinafter alsoreferred to as a flexible substrate) has been developed. Typicalexamples of the flexible device include a lighting device, an imagedisplay device, a variety of semiconductor circuits including asemiconductor element such as a transistor, and the like.

As a method for manufacturing a device including a flexible substrate, atechnique has been developed in which a functional element such as athin film transistor and an organic electroluminescence element (anorganic EL element) is formed over a formation substrate (e.g., a glasssubstrate or a quartz substrate), and then the functional element istransferred to a flexible substrate. This technique needs a process ofpeeling a layer including the functional element from the formationsubstrate (also referred to as a peeling process).

Since a layer including a functional element is thin, a peeling processis performed after a formation substrate is bonded to another supportingsubstrate. In Patent Document 1, peeling is performed with an adhesivelayer provided between a formation substrate and a support substrate,for example. Accordingly, the adhesive layer is between a layer surfaceover which a functional element and the like are provided and a flexiblesubstrate to which the layer is transferred.

REFERENCE Patent Document [Patent Document 1] Japanese Published PatentApplication No. 2012-190794 SUMMARY OF THE INVENTION

An object of one embodiment of the present invention is to provide anovel functional panel that is highly convenient or reliable. Anotherobject of one embodiment of the present invention is to provide a noveldevice that is highly convenient or reliable. Another object of oneembodiment of the present invention is to provide a novel device such asa semiconductor device, a light-emitting device, a display device, anelectronic device, or a lighting device.

One object of one embodiment of the present invention is to reduce thematerial cost in the manufacturing steps. Another object of oneembodiment of the present invention is to save the resource in themanufacturing steps. Another object of one embodiment of the presentinvention is to reduce the number of manufacturing steps.

Note that the descriptions of these objects do not disturb the existenceof any other object. In one embodiment of the present invention, not allof these objects need to be achieved. Other objects can be derived fromthe description of the specification, the drawings, and the claims.

One embodiment of the present invention is a functional panel whichincludes a first substrate, a second substrate, a first layer, a secondlayer, a sealing portion, and a first adhesive layer. The sealingportion is between the first layer and the second layer. The firstadhesive layer is between the first layer and the first substrate. Thesecond substrate includes a region in contact with the second layer.When a surface of the first layer which faces the first substrate isreferred to as a first surface and a surface of the second layer whichis in contact with the second substrate is referred to as a secondsurface, the functional panel includes a plurality of regions havingdifferent distances between the first surface and the second surface.

One embodiment of the present invention is a functional panel whichincludes a first substrate, a second substrate, a first layer, a secondlayer, a third layer, a sealing portion, and a first adhesive layer. Thesealing portion is between the first layer and the second layer. Thefirst adhesive layer is between the first layer and the first substrate.The third layer is between the second layer and the second substrate.When a surface of the first layer which faces the first substrate isreferred to as a first surface and a surface of the second layer whichfaces the second substrate is referred to as a second surface, thefunctional panel includes a plurality of regions having differentdistances between the first surface and the second surface.

One embodiment of the present invention is a functional panel whichincludes a first substrate, a second substrate, a first layer, a secondlayer, a sealing portion, a first adhesive layer, and a second adhesivelayer. The sealing portion is between the first layer and the secondlayer. The first adhesive layer is between the first layer and the firstsubstrate. The second adhesive layer is between the second layer and thesecond substrate. When a surface of the first layer which faces thefirst substrate is referred to as a first surface and a surface of thesecond layer which faces the second substrate is referred to as a secondsurface, the functional panel includes a plurality of regions havingdifferent distances between the first surface and the second surface.

One embodiment of the present invention is a functional panel with anyof the above structures in which at least one of the first layer and thesecond layer includes a projecting portion and the distance between thefirst surface and the second surface in a region including theprojecting portion is longer than that in the other region.

One embodiment of the present invention is a functional panel with anyof the above structures in which the first layer includes a region incontact with the second layer.

One embodiment of the present invention is a functional panel with anyof the above structures in which at least one of the first layer and thesecond layer includes a functional element. One embodiment of thepresent invention is a functional panel in which the functional elementis a transistor, an organic electroluminescent element, or a microelectro mechanical systems (MEMS).

One embodiment of the present invention is a functional panel with anyof the above structures in which the pressure in a space surrounded bythe first layer and the second layer or surrounded by the first layer,the second layer, and the sealing portion is lower than an atmosphericpressure. One embodiment of the present invention is a functional panelin which the pressure in the space is lower than or equal to 10 Pa.

One embodiment of the present invention is a method for manufacturing afunctional panel, including a first step of preparing a first formationsubstrate provided with a first layer with a first peeling layerpositioned therebetween, and a second substrate including a region incontact with the second layer, a second step of bonding the first layerand the second layer to each other with a sealing portion in areduced-pressure atmosphere, a third step of peeling the first peelinglayer and the first layer in an atmosphere with a pressure higher thanthat of the reduced-pressure atmosphere, and a fourth step of bondingthe first layer and the first substrate to each other with a firstadhesive layer.

One embodiment of the present invention is a method for manufacturing afunctional panel, including a first step of preparing a first formationsubstrate provided with a first layer with a first peeling layerpositioned therebetween, and a second substrate provided with the secondlayer with a third layer positioned therebetween, a second step ofbonding the first layer and the second layer to each other with asealing portion in a reduced-pressure atmosphere, a third step ofpeeling the first peeling layer and the first layer in an atmospherewith a pressure higher than that of the reduced-pressure atmosphere, anda fourth step of bonding the first layer and the first substrate to eachother with a first adhesive layer.

One embodiment of the present invention is a method for manufacturing afunctional panel, including a first step of preparing a first formationsubstrate provided with a first layer with a first peeling layerpositioned therebetween, and a second formation substrate provided witha second layer with a second peeling layer positioned therebetween, asecond step of bonding the first layer and the second layer to eachother with a sealing portion in a reduced-pressure atmosphere, a thirdstep of peeling the first peeling layer and the first layer in anatmosphere with a pressure higher than that of the reduced-pressureatmosphere, a fourth step of bonding the first layer and the firstsubstrate to each other with a first adhesive layer, a fifth step ofpeeling the second peeling layer and the second layer in an atmospherewith a pressure higher than that of the reduced-pressure atmosphere, anda sixth step of bonding the second layer and the second substrate toeach other with a second adhesive layer.

One embodiment of the present invention is any of the above methods formanufacturing a functional panel in which the first layer and the secondlayer are bonded to each other in the reduced-pressure atmosphere with apressure lower than or equal to 10 Pa.

One embodiment of the present invention is any of the above methods formanufacturing a functional panel in which an atmospheric pressure ishigher than that of the reduced-pressure atmosphere.

One embodiment of the present invention is a semiconductor device, alight-emitting device, a display device, an electronic device, or alighting device using the functional panel with any of the abovestructures.

Another embodiment of the present invention is a method formanufacturing a semiconductor device, a light-emitting device, a displaydevice, an electronic device, or a lighting device using any of theabove manufacturing methods.

Note that the light-emitting device in this specification includes, inits category, a display device using a light-emitting element.Furthermore, the light-emitting device may be included in a module inwhich a light-emitting element is provided with a connector such as ananisotropic conductive film or a TCP (tape carrier package); a modulehaving a TCP at the tip of which a printed wiring board is provided; anda module in which an IC (integrated circuit) is directly mounted on alight-emitting element by a COG (chip on glass) method. Thelight-emitting device may also be included in lighting equipment or thelike.

One embodiment of the present invention can provide a novel functionalpanel that is highly convenient or reliable. Another embodiment of thepresent invention can provide a novel device that is highly convenientor reliable. Another embodiment of the present invention can provide adevice such as a novel semiconductor device, a novel light-emittingdevice, a novel display device, a novel electronic device, or a novellighting device.

One embodiment of the present invention can reduce the material cost inthe manufacturing steps. Another embodiment of the present invention cansave the resource in the manufacturing steps. Another embodiment of thepresent invention can reduce the number of manufacturing steps.

Note that the descriptions of these effects do not disturb the existenceof any other effects. In one embodiment of the present invention, notall of these effects need to be achieved. Other effects can be derivedfrom the description of the specification, the drawings, and the claims.

BRIEF DESCRIPTION OF THE DRAWINGS

In the accompanying drawings:

FIGS. 1A to 1C illustrate functional panels of an embodiment;

FIGS. 2A to 2C illustrate functional panels of an embodiment;

FIGS. 3A to 3D each illustrate a functional panel of an embodiment;

FIGS. 4A to 4E illustrate a method for manufacturing a functional panelof an embodiment;

FIGS. 5A to 5E illustrate a method for manufacturing a functional panelof an embodiment;

FIGS. 6A to 6E illustrate a method for manufacturing a functional panelof an embodiment;

FIGS. 7A to 7E illustrate a method for manufacturing a functional panelof an embodiment;

FIGS. 8A to 8D illustrate a method for manufacturing a functional panelof an embodiment;

FIGS. 9A to 9D illustrate a method for manufacturing a functional panelof an embodiment;

FIGS. 10A and 10B illustrate structures of a display module of anembodiment;

FIGS. 11A and 11B illustrate structures of a display module of anembodiment;

FIG. 12 illustrates a structure of a display module of an embodiment;and

FIGS. 13A-1, 13A-2, 13A-3, 13B-1, 13B-2, 13C-1, and 13C-2 illustratestructures of data processing devices of an embodiment.

DETAILED DESCRIPTION OF THE INVENTION

Embodiments will be described in detail with reference to theaccompanying drawings. Note that the present invention is not limited tothe description below, and it is easily understood by those skilled inthe art that various changes and modifications can be made withoutdeparting from the spirit and scope of the present invention. Therefore,the present invention should not be construed as being limited to thedescription in the following embodiments.

Note that in the structures of the invention described below, the sameportions or portions having similar functions are denoted by the samereference numerals in different drawings, and description of suchportions is not repeated. Furthermore, the same hatching pattern isapplied to portions having similar functions, and the portions are notespecially denoted by reference numerals in some cases.

The position, size, range, or the like of each structure illustrated indrawings is not accurately represented in some cases for easyunderstanding. Therefore, the disclosed invention is not necessarilylimited to the position, size, range, or the like disclosed in thedrawings.

After formed over a formation substrate, a layer to be peeled can bepeeled off from the formation substrate and then transferred to anothersubstrate. This method makes it possible that, for example, a layer tobe peeled which is formed over a high heat-resistant formation substratecan be transferred to a low heat-resistant substrate, and themanufacturing temperature of the layer to be peeled is not limited bythe low heat-resistant substrate. The layer to be peeled is transferredto a substrate or the like which is more lightweight, thinner, or moreflexible than the formation substrate, whereby a variety of devices suchas a semiconductor device, a light-emitting device, or a display devicecan be made more lightweight, thinner, and more flexible. Note that thelayer to be peeled is also referred to as a first layer or a secondlayer in this specification.

A device that can be manufactured according to one embodiment of thepresent invention includes a functional element. Examples of thefunctional element include a semiconductor element such as a transistor;a light-emitting diode; a light-emitting element such as an inorganic ELelement and an organic EL element; and a display element such as aliquid crystal element. For example, a semiconductor device including atransistor and a light-emitting device including a light-emittingelement (here, a display device including a transistor and alight-emitting element is also included) are examples of the device thatcan be manufactured according to the present invention.

For example, to protect an organic EL element that is likely todeteriorate due to moisture or the like, a protective film having lowwater permeability can be formed over a glass substrate at a hightemperature and transferred to an organic resin substrate havingflexibility. Even when heat resistance or a waterproof property of theorganic resin substrate is low, a highly reliable flexiblelight-emitting device can be manufactured by forming an organic ELelement over the protective film transferred to the organic resinsubstrate.

Embodiment 1 Structure Example 1-1 of Functional Panel

FIGS. 1A to 1C illustrate structures of a functional panel of oneembodiment of the present invention. FIGS. 1A and 1B each are a top viewof a functional panel 100 of one embodiment of the present invention,and FIG. 1C is a cross-sectional view taken along lines X1-X2 and X3-X4in FIG. 1A. In FIGS. 1A and 1B, some components are omitted.

The functional panel 100 includes a first substrate 101, a secondsubstrate 102, a first layer 103, a second layer 104, a sealing portion105, a first adhesive layer 106, and a first partition 107. The firstlayer 103 includes a thin film portion 103A and a projecting portion103B. Note that the dotted lines in the first layer 103 in the drawingrepresent boundaries between the thin film portion 103A and theprojecting portion 103B.

The projecting portion 103B can have a variety of geometrical shapes.For example, the number of projecting portions 103B can be one or more.Side surfaces of the projecting portion 103B may be tapered, reverselytapered, or perpendicular with respect to the surfaces around theprojecting portion. The projecting portion 103B can have a latticestructure when seen from above (see FIG. 1A). The projecting portion103B can have island structures (see FIG. 1B). The islands may have anyshape when seen from above; a circle shape or a polygonal shape.

The first layer 103 and the second layer 104 are bonded to each otherwith the sealing portion 105 provided therebetween. For example, thesealing portion 105 is provided surrounding at least one of theprojecting portions 103B.

The second substrate 102 includes a region in contact with the secondlayer 104. The first adhesive layer 106 is between the first layer 103and the first substrate 101. The first partition 107 is providedsurrounding the first adhesive layer 106.

When a surface of the first layer 103 which faces the first substrate101 is referred to as a first surface and a surface of the second layer104 which is in contact with the second substrate 102 is referred to asa second surface, the functional panel 100 includes a plurality ofregions having different distances between the first surface and thesecond surface.

For example, a distance 123, which is between the first surface and thesecond surface in a region 121 including the projecting portion 103B, islonger than a distance 124, which is between the first surface and thesecond surface in a region 122 around the region 121.

Although FIG. 1C shows an example in which the first substrate 101 isflat and the first adhesive layer 106 partly differs in thickness, astructure may also be used in which the thickness of the first adhesivelayer 106 is uniform and the first substrate 101 waves. The structure ismodified depending on the manufacturing methods.

The first layer 103 includes a region in contact with the second layer104.

The pressure in the space surrounded by the first layer 103 and thesecond layer 104 or by the first layer 103, the second layer 104, andthe sealing portion 105 is preferably lower than an atmosphericpressure. The pressure in the above space is preferably lower than orequal to 10 Pa, further preferably lower than or equal to 1 Pa.

<<First Substrate, Second Substrate>>

As the first substrate 101 or the second substrate 102, a substratehaving at least heat resistance high enough to withstand processtemperature in a fabrication process is used. As the first substrate 101or the second substrate 102, for example, a glass substrate, a quartzsubstrate, a sapphire substrate, a semiconductor substrate, a ceramicsubstrate, a metal substrate, a resin substrate, or a plastic substratecan be used.

<<First Layer>>

There is no particular limitation on materials which can be used for thefirst layer 103. For example, a film including an insulating film andthe projecting portion 103B stacked thereover can be used as the firstlayer 103. The first layer 103 includes a functional element. Note thatin the case where the second layer 104 includes a functional element,the first layer 103 does not include a functional element in some cases.

In this embodiment, an insulating layer is used as a layer included inthe first layer 103 which is in contact with the first adhesive layer106.

The insulating layer which is in contact with the first adhesive layer106 can have a structure including one film selected from a siliconnitride film, a silicon oxynitride film, a silicon oxide film, a siliconnitride oxide film, and the like, or a stacked structure of a pluralityof films selected from them.

The insulating layer can be formed by a sputtering method, a plasma CVDmethod, a coating method, a printing method, or the like. For example,the insulating layer is formed at a temperature higher than or equal to250° C. and lower than or equal to 400° C. by a plasma CVD method,whereby the insulating layer can be a dense film with very low waterpermeability. Note that the thickness of the insulating layer ispreferably greater than or equal to 10 nm and less than or equal to 3000nm, further preferably greater than or equal to 200 nm and less than orequal to 1500 nm.

<<Thin Film Portion, Projecting Portion>>

In this specification, a projecting portion is referred to as a portionwhich projects from the surrounding surface. The projecting portionpreferably projects from the surrounding surface by longer than or equalto 100 nm, further preferably by longer than or equal to 500 nm. Notethat when the layer waves as the first layer 103 in FIG. 1C, theprojecting portion means a thicker portion. In that case, the projectingportion is preferably thicker than the surrounding film by greater thanor equal to 100 nm, further preferably greater than or equal to 500 nm.

Portions other than the above projecting portion are referred to as thinfilm portions.

<<Functional Element>>

The first layer 103 includes a device having a function. A transistor,an organic EL element, a MEMS, or the like can be used as the device.

Note that a functional panel including the first layer 103 provided witha display element such as an organic EL element or a display elementusing a MEMS can be called a display panel.

For example, the first layer 103, which includes a plurality oflight-emitting elements that emit white light, and the second layer 104,which is in contact with the first layer 103 and includes a colorfilter, can be used for the functional panel 100. In this structure, thegap between the light-emitting element and the color filter iseliminated or partly narrowed as compared to that in the conventionalstructure such as a structure in which an adhesive is filled between thelight-emitting element and the color filter. No gap or a partly narrowedgap improves the viewing angle of the functional panel 100, reduces thelight leakage from the adjacent pixel, and increases the reliability. Inaddition, there is no adhesive layer between the first layer and thesecond layer, reducing penetration of a resin or damage.

The first layer 103 and the second layer 104 are in contact with eachother, whereby they can be electrically connected to each other.

For example, in the case where the first layer 103 is provided with anorganic EL element including a cathode and an anode and the second layer104 is provided with an auxiliary wiring, the cathode of the organic ELelement provided in the first layer 103 or a wiring which iselectrically connected to the cathode can be electrically connected tothe wiring included in the second layer 104 in a contact region.Accordingly, the auxiliary wiring can reduce a voltage drop in thecathode of the organic EL element. Thus, the present invention canprovide a novel functional panel.

<<Second Layer>>

There is no particular limitation on materials which can be used for thesecond layer 104. For example, a material which can be used for thefirst layer 103 can be used. The second layer 104 may include afunctional element.

Any film such as an insulating film, a semiconductor film, and a metalfilm can be used as the second layer 104. The film used for the firstlayer 103 can be used as the second layer 104.

A region in which the first layer 103 and the second layer 104 are incontact with each other is provided, whereby they can be adhered to eachother so as to be electrically connected, for example. A film which isdifficult to form over the first layer 103 is formed as the second layer104 and makes an electrical contact therebetween, which produces thesame effect as that when the second layer 104 is formed directly on thefirst layer 103. For example, when an organic EL element is formed as afunctional element of the first layer 103, a patterning treatmentincluding a cleaning process with water or a resist peeling process, ahigh-temperature heat treatment, or the like is difficult to beperformed after the first layer 103 is formed. However, the same effectas that when the second layer 104 is formed over the first layer 103 canbe achieved in some cases in such a manner that the second layer 104including a wiring and the like is formed by a patterning treatmentincluding a cleaning process with water or a resist peeling process, ahigh-temperature heat treatment, or the like, and then a region in whichthe first layer 103 and the second layer 104 are in contact with eachother is provided.

<<First Adhesive Layer>>

As the first adhesive layer 106, various curable adhesives such as areactive curable adhesive, a thermosetting adhesive, an anaerobicadhesive, and a photo curable adhesive such as an ultraviolet curableadhesive can be used. Examples of these adhesives include an epoxyresin, an acrylic resin, a silicone resin, a phenol resin, a polyimideresin, an imide resin, a polyvinyl chloride (PVC) resin, a polyvinylbutyral (PVB) resin, and an ethylene vinyl acetate (EVA) resin. Inparticular, a material with low moisture permeability, such as an epoxyresin, is preferred. Alternatively, a two-component-mixture-type resinmay be used.

Further, the resin may include a drying agent. For example, a substancewhich adsorbs moisture by chemical adsorption, such as an oxide of analkaline earth metal (e.g., calcium oxide and barium oxide), can beused. Alternatively, a substance which adsorbs moisture by physicaladsorption, such as zeolite and silica gel, may be used. The dryingagent is preferably included, in which case it can suppressdeterioration of the functional element due to entry of moisture in theair and can improve the reliability of the device.

In addition, a filler with a high refractive index or a light scatteringmember is mixed into the resin, whereby the efficiency of lightextraction from the light-emitting element can be improved. For example,titanium oxide, barium oxide, zeolite, zirconium, or the like can beused.

<<Sealing Portion, First Partition>>

For the sealing portion 105 and the first partition 107, materials whichcan be used for the first adhesive layer 106 can be used. Differentmaterials can be used for the sealing portion 105 and the firstpartition 107.

Structure Example 1-2 of Functional Panel

Although the first layer 103 includes the thin film portion 103A and theprojecting portion 103B in the structure example 1-1, the second layer104 may include a thin film portion 104A and a projecting portion 104Bas shown in FIG. 3A. Note that the dotted lines in the second layer 104in the drawing represent the boundaries between the thin film portion104A and the projecting portion 104B.

Structure Example 1-3 of Functional Panel

FIG. 3B illustrates a structure of a functional panel of one embodimentof the present invention.

The functional panel in FIG. 3B includes a first substrate 101, a secondsubstrate 102, a first layer 103, a second layer 104, a third layer 110,a sealing portion 105, a first adhesive layer 106, and a first partition107. The first layer 103 includes a thin film portion 103A and aprojecting portion 103B.

There is no particular limitation on materials which can be used for thethird layer 110. For example, a material which can be used for the firstlayer 103 can be used. The third layer 110 may include a functionalelement.

The first layer 103 and the second layer 104 are bonded to each otherwith a sealing portion 105 provided therebetween. The sealing portion105 is provided surrounding at least one of the projecting portions103B.

The first adhesive layer 106 is between the first layer 103 and thefirst substrate 101. The third layer 110 is between the second layer 104and the second substrate 102. The first partition 107 is providedsurrounding the first adhesive layer 106.

When a surface of the first layer 103 which faces the first substrate101 is referred to as a first surface and a surface of the second layer104 which faces the second substrate 102 is referred to as a secondsurface, the functional panel 100 includes a plurality of regions havingdifferent distances between the first surface and the second surface.

For example, a distance 123, which is between the first surface and thesecond surface in a region 121 including the projecting portion 103B, islonger than a distance 124, which is between the first surface and thesecond surface in a region 122 around the region 121.

Although FIG. 3B shows an example in which the first substrate 101 isflat and the first adhesive layer 106 partly differs in thickness, astructure may also be used in which the thickness of the first adhesivelayer 106 is uniform and the first substrate 101 is waved. The structureis changed depending on the manufacturing method.

The first layer 103 includes a region in contact with the second layer104.

Structure Example 1-4 of Functional Panel

Although the first layer 103 includes the thin film portion 103A and theprojecting portion 103B in the structure example 1-3, the second layer104 may include a thin film portion 104A and a projecting portion 104Bas shown in FIG. 3C.

Structure Example 2 of Functional Panel

FIGS. 2A to 2C illustrate the structures of functional panels of oneembodiment of the present invention. FIGS. 2A and 2B each are a top viewof a functional panel 200 of one embodiment of the present invention,and FIG. 2C is a cross-sectional view taken along lines X1-X2 and X3-X4in FIG. 2A.

The functional panel 200 includes a first substrate 201, a secondsubstrate 202, a first layer 203, a second layer 204, a sealing portion205, a first adhesive layer 206, a second adhesive layer 207, and asecond partition 209. The first layer 203 includes a thin film portion203A and a projecting portion 203B. Note that the dotted lines in thefirst layer 203 in the drawing represent boundaries between the thinfilm portion 203A and the projecting portion 203B.

The projecting portion 203B can have a variety of geometrical shapes.For example, the number of projecting portions 203B can be one or more.Specifically, the projecting portion 203B can have a lattice structure(see FIG. 2A). The projecting portion 203B can have island structures(see FIG. 2B).

The first layer 203 and the second layer 204 are bonded to each otherwith a sealing portion 205 provided therebetween. For example, thesealing portion 205 is provided surrounding at least one of theprojecting portions 203B.

The first adhesive layer 206 is between the first layer 203 and thefirst substrate 201. The second adhesive layer 207 is between the secondlayer 204 and the second substrate 202. The second partition 209 isprovided surrounding the second adhesive layer 207.

When a surface of the first layer 203 which faces the first substrate201 is referred to as a first surface and a surface of the second layer204 which faces the second substrate 202 is referred to as a secondsurface, the functional panel 200 includes a plurality of regions havingdifferent distances between the first surface and the second surface.

For example, a distance 223, which is between the first surface and thesecond surface in a region 221 including the projecting portion 203B, islonger than a distance 224, which is between the first surface and thesecond surface in a region 222 around the region 221.

Although FIG. 2C shows a structure in which the first layer 203 waves, astructure may also be used in which the second layer 204 waves as shownin FIG. 3D.

Materials which can be used for the first substrate 101 can be used forthe first substrate 201. Additionally, materials which can be used forthe second substrate 102, the first layer 103, and the second layer 104can be used for the second substrate 202, the first layer 203, and thesecond layer 204, respectively.

For the first adhesive layer 206, the adhesive layer 207, the secondpartition 209, and the sealing portion 205, materials which can be usedfor the first adhesive layer 106 can be used. Different materials can beused for the first adhesive layer 206, the adhesive layer 207, thesecond partition 209, and the sealing portion 205.

This embodiment can be combined with any of the other embodiments inthis specification as appropriate.

Embodiment 2 Manufacturing Method 1-1 of Functional Panel

A manufacturing method 1-1 of a functional panel includes the four stepsdescribed below.

<<First Step>>

A first formation substrate 108 which is provided with the first layer103 with a first peeling layer 109 positioned therebetween is prepared.The second substrate 102 including a region which is in contact with thesecond layer 104 is prepared (FIG. 4A).

For example, the first peeling layer 109 is formed over the firstformation substrate 108. Although an example in which the first peelinglayer 109 is formed to have an island shape is described here, oneembodiment of the present invention is not limited to this example.

The first layer 103 including the thin film portion 103A and theprojecting portion 103B is formed over the first peeling layer 109. Thefirst layer 103 may be formed to have an island shape.

A material with which the first layer 103 can be peeled from the firstformation substrate 108 is selected and used for the first layer 103 andthe first peeling layer 109. For example, a material is selected so thatthe first layer 103 can be peeled at the interface between the firstformation substrate 108 and the first peeling layer 109 or at theinterface between the first peeling layer 109 and the first layer 103 orthe first layer 103 can be peeled by breaking the first peeling layer109 itself.

Although an example in which the first layer 103 is peeled at theinterface between the first layer 103 and the first peeling layer 109 isdescribed in this embodiment, one embodiment of the present invention isnot limited to such an example depending on a material used for thefirst peeling layer 109 or the first layer 103.

For example, in the case where a tungsten film, a tungsten oxide film,and the first layer 103 are stacked in this order, a layer including thefirst layer 103 can be peeled at the interface between the tungsten filmand the tungsten oxide film (or in the vicinity of the interface). Notethat part of the first peeling layer 109 (here, the tungsten oxide film)remains on the side of the layer including the first layer 103 in somecases. The first peeling layer 109 remaining on the first layer 103 sidemay be removed after that.

For example, a structure in which the first peeling layer 109 as well asthe first layer 103 is peeled at the interface between the firstformation substrate 108 and the first peeling layer 109 can be used.Specifically, a glass plate is used as the first formation substrate 108and polyimide can be used for the first peeling layer 109.

<<First Formation Substrate>>

As the first formation substrate 108, various substrates that can beused as the first substrate 101 can be used. Alternatively, a flexiblesubstrate such as a film may be used.

Note that a large-sized glass substrate is preferably used as the firstformation substrate 108 in terms of productivity. For example, a glasssubstrate having any of the following sizes or a larger size can beused: the 3rd generation (550 mm×650 mm), the 3.5th generation (600mm×720 mm or 620 mm×750 mm), the 4th generation (680 mm×880 mm or 730mm×920 mm), the 5th generation (1100 mm×1300 mm), the 6th generation(1500 mm×1850 mm), the 7th generation (1870 mm×2200 mm), the 8thgeneration (2200 mm×2400 mm), the 9th generation (2400 mm×2800 mm or2450 mm×3050 mm), and the 10th generation (2950 mm×3400 mm).

In the case where a glass substrate is used as the first formationsubstrate 108, as a base film, an insulating film such as a siliconoxide film, a silicon oxynitride film, a silicon nitride film, or asilicon nitride oxide film is preferably formed between the firstformation substrate 108 and the first peeling layer 109, in which casecontamination from the glass substrate can be prevented.

<<First Peeling Layer>>

The first peeling layer 109 can be formed using an element selected fromtungsten, molybdenum, titanium, tantalum, niobium, nickel, cobalt,zirconium, zinc, ruthenium, rhodium, palladium, osmium, iridium, andsilicon; an alloy material containing any of the elements; a compoundmaterial containing any of the elements; or the like. A crystalstructure of a layer containing silicon may be amorphous, microcrystal,or polycrystal. Furthermore, a metal oxide such as aluminum oxide,gallium oxide, zinc oxide, titanium dioxide, indium oxide, indium tinoxide (ITO), indium zinc oxide, or an In—Ga—Zn oxide can be used. Thefirst peeling layer 109 is preferably formed using a high-melting pointmetal material such as tungsten, titanium, or molybdenum, in which casethe degree of freedom of the process for forming the first layer 103 canbe increased.

The first peeling layer 109 can be formed by, for example, a sputteringmethod, a plasma CVD method, a coating method (including a spin coatingmethod, a droplet discharging method, a dispensing method, and thelike), a printing method, or the like. The thickness of the firstpeeling layer 109 is, for example, greater than or equal to 10 nm andless than or equal to 200 nm, or preferably greater than or equal to 20nm and less than or equal to 100 nm.

In the case where the first peeling layer 109 has a single-layerstructure, a tungsten layer, a molybdenum layer, or a layer containing amixture of tungsten and molybdenum is preferably formed. Alternatively,a layer containing an oxide or an oxynitride of tungsten, a layercontaining an oxide or an oxynitride of molybdenum, or a layercontaining an oxide or an oxynitride of a mixture of tungsten andmolybdenum may be formed. Note that the mixture of tungsten andmolybdenum is an alloy of tungsten and molybdenum, for example.

In the case where the first peeling layer 109 is formed to have astacked-layer structure including a layer containing tungsten and alayer containing an oxide of tungsten, the layer containing an oxide oftungsten may be formed as follows: the layer containing tungsten isformed first and an insulating film formed of an oxide is formedthereover, so that the layer containing an oxide of tungsten is formedbetween the tungsten layer and the insulating film.

The surface of the layer including tungsten may be subjected to asurface oxidation treatment, so that a layer including an oxide oftungsten is formed.

For example, thermal oxidation treatment, oxygen plasma treatment,nitrous oxide (N₂O) plasma treatment, treatment with a highly oxidizingsolution such as ozone water, or the like can be used as the surfaceoxidation treatment. Alternatively, plasma treatment or heat treatmentmay be performed in an atmosphere of oxygen, nitrogen, or nitrous oxidealone, or a mixed gas of any of these gasses and another gas. Surfacecondition of the first peeling layer 109 is changed by the plasmatreatment or heat treatment, whereby adhesion between the first peelinglayer 109 and an insulating layer formed later can be controlled.

Note that the layer to be peeled may be peeled at the interface betweenthe formation substrate and the layer to be peeled. For example, a glasssubstrate is used as the formation substrate, and an organic resin suchas polyimide, polyester, polyolefin, polyamide, polycarbonate, oracrylic which is formed in contact with the glass substrate can be usedas the layer to be peeled. Note that an insulating film, a transistor, alight-emitting element, or the like can be formed over the organicresin. The layer to be peeled corresponds to the first layer 103 here.

For example, locally heating the organic resin by laser light or thelike enables the organic resin to be peeled at the interface between theformation substrate and the organic resin. Alternatively, peeling of theorganic resin at the interface between a metal layer and the organicresin may be performed in the following manner the metal layer isprovided between the formation substrate and the organic resin andcurrent is made to flow in the metal layer so that the metal layer isheated.

Note that the peeled organic resin can be used as a substrate supportingan insulating film, a transistor, a light-emitting element, or the likeprovided over the organic resin. Alternatively, the organic resin may beattached to another substrate with an adhesive.

As a method for preparing the second substrate 102 supporting the secondlayer 104, the second layer 104 is formed over the second substrate 102,for example. Either an organic film or an inorganic film may be used asthe second layer 104 (FIG. 4A). Although the second layer 104 is formedover the entire surface of the second substrate 102 in FIG. 4A, thesecond layer 104 may have an island shape.

<<Second Step>>

A sealant is formed on the first layer 103 so as to surround at leastone of the projecting portions 103B, for example.

The sealant may be formed over the second layer 104. In that case, thesealing portion 105 is formed so as to surround the projecting portion103B of the first layer 103 in bonding.

Next, the first layer 103 and the second layer 104 are bonded to eachother with the sealant, so that the sealing portion 105 is formed (FIG.4B).

The first layer 103 and the second layer 104 are bonded to each other ina reduced pressure atmosphere. The pressure in the reduced pressureatmosphere is lower than an atmospheric pressure. The pressure in thereduced pressure atmosphere is preferably lower than or equal to 10 Pa,further preferably lower than or equal to 1 Pa, for example.

<<Third Step>>

Next, the pressure in the atmosphere is made to be higher than that ofthe reduced pressure atmosphere of the second step. Then, the firstlayer 103 is peeled from the first peeling layer 109. For example, thepeeling can be performed in an atmospheric pressure atmosphere or apressured atmosphere.

As a method for peeling the first layer 103 from the first peeling layer109, a method in which a separation trigger 111 is formed and thepeeling is performed from the separation trigger can be used.Specifically, the separation trigger can be formed by a laser lightirradiation method or the like (FIG. 4B).

Note that a point where part of the first layer 103 is peeled from thefirst peeling layer 109 is referred to as a separation trigger in thisspecification. For example, the separation trigger can be formed by abreak or a crack formed in an interface layer (a layer included in thefirst layer 103 that is in contact with the first peeling layer 109).

At this time, not only the interface layer but also the other layersincluded in the first layer 103, the first peeling layer 109, or part ofthe sealing portion 105 may be removed.

Specifically, the separation trigger can be formed in such a manner thatpart of the film is melted, evaporated, or thermally broken by laserlight irradiation.

Alternatively, the separation trigger can be formed by shaving with asharp knife or the like.

Note that the pressure in the space surrounded by the first layer 103,the second layer 104, and the sealing portion 105 is lower than that ofthe atmosphere in which the peeling is performed. The above pressuredifference adds stress to the surface of the first layer 103 from whichthe first formation substrate 108 is peeled in a region where thepeeling of the first formation substrate 108 is already performed whilethe peeling progresses. As a result, regions having different distancesbetween the first surface and the second surface are formed. Inaddition, a region in which the first layer 103 is in contact with thesecond layer 104 is formed (FIG. 4C).

Through the third step, the first layer 103 can be transferred to thesecond substrate 102 from the first formation substrate 108 (FIG. 4D).Note that one of the substrates is preferably fixed to a suction stageor the like. For example, the first formation substrate 108 may be fixedto a suction stage to peel the first layer 103 from the first formationsubstrate 108. Alternatively, the second substrate 102 may be fixed to asuction stage to peel the first formation substrate 108 from the secondsubstrate 102.

For example, the first layer 103 and the first formation substrate 108may be separated by mechanical force (a peeling process with a humanhand or a gripper, a peeling process by rotation of a roller, or thelike) by utilizing the separation trigger. The peeling step ispreferably performed with an apparatus capable of performing the peelingautomatically.

The first formation substrate 108 and the first layer 103 may beseparated by filling the interface between the first peeling layer 109and the first layer 103 with liquid such as water. A portion between thefirst peeling layer 109 and the first layer 103 absorbs a liquid throughcapillarity action, so that the first peeling layer 109 can be separatedeasily. Furthermore, an adverse effect on the functional elementincluded in the first layer 103 due to static electricity caused atseparation (e.g., a phenomenon in which a semiconductor element isdamaged by static electricity) can be suppressed.

<<Fourth Step>>

The exposed first layer 103 is interposed between the second substrate102 and the first substrate 101, the first layer 103 and the firstsubstrate 101 are bonded to each other with the first adhesive layer106, and the first adhesive layer 106 is cured (FIG. 4E).

In this embodiment, a frame-shaped first partition 107 is provided tolimit expansion of a liquid material to be a first adhesive layer 106,and the first layer 103 and the first substrate 101 are bonded to eachother with the liquid material to be the first adhesive layer 106dropped inside the first partition 107.

Note that the first partition 107 is provided to limit the range of thefirst adhesive layer 106, and the first partition 107 is not necessarilyprovided if the first adhesive layer 106 is provided in a limitedregion. For example, a first sheet-like adhesive layer 106 can be used.

In the case where the first substrate 101 and the second substrate 102are attached to a flat substrate support for the bonding process, thefirst substrate 101 is flat and the first adhesive layer 106 partly hasdifferent thicknesses as shown in FIG. 4E. In the case where the firstsubstrate 101 and the second substrate 102 are bonded to each otherthrough two rollers to which pressure is added, the first adhesive layer106 has a uniform thickness and the first substrate 101 waves in somecases.

The functional panel can be manufactured using a method formanufacturing a functional panel of one embodiment of the presentinvention including the first to fourth steps. An adhesive layer filledinto the space between the first layer 103 and the second layer 104 isnot needed, so that the material for the adhesive layer is not required,which lead's to resource saving and cost reduction. Furthermore, sincethe first layer 103 and the second layer 104 are bonded to each otheronly in a sealing portion, the process can be simplified, which canreduce the cost in the manufacturing process.

<Manufacturing Method 1-2 of Functional Panel>

Although the first layer 103 includes the thin film portion 103A and theprojecting portion 103B in the manufacturing method 1-1, the secondlayer 104 may include the thin film portion 104A and the projectingportion 104B (FIGS. 5A to 5E).

<Manufacturing Method 1-3 of Functional Panel>

A manufacturing method 1-3 of a functional panel includes the four stepsdescribed below.

<<First Step>>

A first formation substrate 108 which is provided with the first layer103 with the first peeling layer 109 positioned therebetween isprepared. The second substrate 102 which is provided with the secondlayer 104 with the third layer 110 positioned therebetween is prepared(FIG. 6A).

For example, the first peeling layer 109 is formed over the firstformation substrate 108, and the first layer 103 including the thin filmportion 103A and the projecting portion 103B is formed over the firstpeeling layer 109. The third layer 110 is formed over the secondsubstrate 102, and the second layer 204 is formed over the third layer110.

<<Second to Fourth Steps>>

The same steps as those described in the manufacturing method 1-1 of thefunctional panel can be applied to the second to fourth steps (FIGS. 6Bto 6E).

<Manufacturing Method 1-4 of Functional Panel>

Although the first layer 103 includes the thin film portion 103A and theprojecting portion 103B in the manufacturing method 1-3, the secondlayer 104 may include the thin film portion 104A and the projectingportion 104B (FIGS. 7A to 7E).

<Manufacturing Method 2 of Functional Panel>

A manufacturing method 2 of a functional panel includes the six stepsdescribed below.

<<First Step>>

A first formation substrate 210 which is provided with the first layer203 with a first peeling layer 212 positioned therebetween and a secondformation substrate 211 which is provided with the second layer 204 witha second peeling layer 213 positioned therebetween are prepared (FIG.8A).

For example, the first peeling layer 212 is formed over the firstformation substrate 210, and the first layer 203 including the thin filmportion 203A and the projecting portion 203B is formed over the firstpeeling layer 212. The second peeling layer 213 is formed over a secondformation substrate 211, and the second layer 204 is formed over thesecond peeling layer 213.

For the first formation substrate 210 and the second formation substrate211, materials which can be used for the first formation substrate 108can be used. For the first peeling layer 212 and the second peelinglayer 213, materials which can be used for the first peeling layer 109can be used. Different materials can be used for the first formationsubstrate 210 and the second formation substrate 211, and the firstpeeling layer 212 and the second peeling layer 213.

<<Second Step>>

A sealant is formed on the first layer 203 so as to surround at leastone of the projecting portions 203B.

The sealant may be formed over the second layer 204. In that case, asealing portion 205 is formed so as to surround the projecting portion203B of the first layer 203 in bonding.

Next, the first formation substrate 210 and the second formationsubstrate 211 are bonded to each other with the sealant so that thefirst layer 203 faces the second layer 204 and the sealing portion 205is formed (FIG. 8B).

The first formation substrate 210 and the second formation substrate 211are bonded to each other in a reduced pressure atmosphere. The pressurein the reduced pressure atmosphere is preferably lower than or equal to10 Pa, further preferably lower than or equal to 1 Pa.

Although FIG. 8B illustrates the case where the first peeling layer 212and the second peeling layer 213 have the same size, peeling layers withdifferent sizes may be used.

<<Third Step>>

Next, a separation trigger 214 is formed by laser light irradiation(FIG. 8B).

Whichever the first formation substrate 210 or the second formationsubstrate 211 may be peeled first. In the case where the peeling layersdiffer in size, a substrate over which a larger peeling layer is formedmay be peeled first or a substrate over which a smaller peeling layer isformed may be peeled first. In the case where an element such as asemiconductor element, a light-emitting element, or a display element isformed only over one of the substrates, the substrate on the side ofwhich the element is formed over may be peeled first or the othersubstrate may be peeled first. Here, an example in which the firstformation substrate 210 is peeled first is described.

A region where the cured sealing portion 205, the first layer 203, andthe first peeling layer 212 overlap with each other is irradiated withlaser light.

The separation trigger 214 can be formed in such a manner that part ofan interface layer (the layer included in the first layer 203 that is incontact with the first peeling layer 212) is removed. At this time, notonly the interface layer but also the other layers included in the firstlayer 203, the first peeling layer 212, or part of the sealing portion205 may be removed.

Laser light irradiation is preferably performed from the substrate sideprovided with the peeling layer which is desirably peeled. When a regionwhere the first peeling layer 212 and the second peeling layer 213overlap with each other is irradiated with laser light, a crack isformed only in the first layer 203, not both of the first layer 203 andthe second layer 204, so that the first formation substrate 210 and thefirst peeling layer 212 can be selectively peeled.

In the case where the region where the first peeling layer 212 and thesecond peeling layer 213 overlap with each other is irradiated withlaser light, separation triggers formed in both the first layer 203 onthe first peeling layer 212 side and the second layer 204 on the secondpeeling layer 213 side might make it difficult to peel one of theformation substrates selectively. Therefore, laser light irradiationconditions might be restricted so that only one of the layers to bepeeled is cracked.

The first layer 203 and the first formation substrate 210 are separatedfrom a separation trigger 214. The peeling is performed in a pressurehigher than the reduced pressure atmosphere in which the bonding isperformed. For example, the peeling can be performed in an atmosphericpressure atmosphere or a pressured atmosphere.

Note that the pressure in the space surrounded by the first layer 203,the second layer 204, and the sealing portion 205 is lower than that ofthe atmosphere in which the peeling is performed. The above pressuredifference adds stress to the surface of the first layer 203 from whichthe first formation substrate 210 is peeled in a region where thepeeling of the first formation substrate 210 is already performed whilethe peeling progresses. As a result, regions having different distancesbetween the first surface and the second surface are formed. Inaddition, a region in which the first layer 203 is in contact with thesecond layer 204 is formed (FIG. 8C).

Accordingly, the first layer 203 can be transferred to the secondformation substrate 211 from the first formation substrate 210 (FIG.8D).

<<Fourth Step>>

The exposed first layer 203 is interposed between the second formationsubstrate 211 and the first substrate 201, the first layer 203 and thefirst substrate 201 are bonded to each other with the first adhesivelayer 206, and the first adhesive layer 206 is cured (FIG. 9A). Here, aframe-shaped first partition 208 is provided to limit expansion of aliquid material to be a first adhesive layer 206, and the first layer203 and the first substrate 201 are bonded to each other with the liquidmaterial to be the first adhesive layer 206 dropped inside the firstpartition 208. The materials which can be used for the first adhesivelayer 106 can be used for the first partition 208.

Next, a separation trigger 215 is formed by laser light irradiation.

A region where the first cured adhesive layer 206 and the sealingportion 205 overlap with each other, or where the first cured partition208, the second layer 204, and the second peeling layer 213 overlap witheach other is irradiated with laser light. An example in which the firstadhesive layer 206 is in a cured state and the first partition 208 isnot in a cured state is described here, and the first cured adhesivelayer 206 is irradiated with laser light.

The separation trigger can be formed in such a manner that part of aninterface layer (the layer included in the second layer 204 that is incontact with the second peeling layer 213) is removed. At this time, notonly the interface layer but also the other layers included in thesecond layer 204, the second peeling layer 213, or part of the firstadhesive layer 206 may be removed.

Laser light irradiation is preferably performed from the side of thesecond formation substrate 211 provided with the second peeling layer213.

<<Fifth Step>>

The second layer 204 and the second formation substrate 211 are peeledfrom the separation trigger 215 (FIGS. 9B and 9C). Accordingly, thefirst layer 203 and the second layer 204 can be transferred to the firstsubstrate 201.

<<Sixth Step>>

The exposed second layer 204 is interposed between the first substrate201 and the second substrate 202, the second layer 204 and the secondsubstrate 202 are bonded to each other with the second adhesive layer207, and the second adhesive layer 207 is cured (FIG. 9D). Here, aframe-shaped second partition 209 is provided to limit expansion of aliquid material to be a second adhesive layer 207, and the second layer204 and the second substrate 202 are bonded to each other with theliquid material to be the second adhesive layer 207 dropped inside thesecond partition 209.

An adhesive layer filled into the space between the first layer 203 andthe second layer 204 is not needed in the above peeling method of oneembodiment of the present invention, so that the material for theadhesive layer is not required, which leads to resource saving and costreduction. The step for forming the adhesive layer can be reduced, sothat the number of steps can be reduced, which can reduce the cost inthe manufacturing process.

This embodiment can be combined with any of the other embodiments inthis specification as appropriate.

Embodiment 3

In this embodiment, a structure of a display module of one embodiment ofthe present invention which can be used for an input/output device willbe described with reference to FIGS. 10A and 10B, FIGS. 11A and 11B, andFIG. 12.

FIGS. 10A and 10B, FIGS. 11A and 11B, and FIG. 12 illustrate a structureof a display module of one embodiment of the present invention.

FIG. 10A is a top view of a display module 500 of one embodiment of thepresent invention, and FIG. 10B is a cross-sectional view taken alonglines A-B and C-D in FIG. 10A. FIG. 11A is a top view illustrating astructure of part of the display module 500, and FIG. 11B is across-sectional view taken along line W3-W4 in FIG. 11A.

FIG. 12 is a projection view illustrating the display module 500 of oneembodiment of the present invention. Note that part of the displaymodule 500 is enlarged for convenience of description.

Structure Example of Display Module

The display module 500 of one embodiment of the present inventionincludes a first terminal portion 519A; a first flexible substrate 510which supports the first terminal portion 519A; a second flexiblesubstrate 570 which has a region overlapping with the first substrate510 and includes a second terminal portion 519B; a first layer 503 whichincludes a transistor MD, a transistor M0, a display element 550R, aspacer KB, and the like; a second layer 504 which includes a coloringlayer CF, a light-blocking layer BM, a sensing element, and the like; asealing portion 505; a first adhesive layer 506 which is providedbetween the first substrate 510 and the first layer 503; and a secondadhesive layer 507 which is provided between the second substrate 570and the second layer 504 (see FIGS. 10A and 10B).

The display module 500 of one embodiment of the present inventionincludes a display portion. The display portion includes a displayelement 550R between the first substrate 510 and the second substrate570, the first terminal portion 519A electrically connected to thedisplay element 550R, and a first flexible printed circuit FPC1electrically connected to the first terminal portion 519A.

The display module 500 of one embodiment of the present inventionfurther includes a sensing portion. The sensing portion includes a touchsensor between the first substrate 510 and the second substrate 570, thesecond terminal portion 519B electrically connected to the touch sensor,and a second flexible printed circuit FPC2 electrically connected to thesecond terminal portion 519B (see FIG. 10A).

<<Display Portion>>

The display module 500 of one embodiment of the present inventionfurther includes a pixel 502 to which a control signal and an imagesignal are supplied, a region 501 in which the pixels 502 are arranged,a driver circuit GD which supplies the control signal, a driver circuitSD which supplies the image signal, a wiring 511 electrically connectedto the driver circuit SD, and the first terminal portion 519Aelectrically connected to the wiring 511 (see FIGS. 10A and 10B).

The pixel 502 includes a plurality of subpixels (e.g., subpixel 502R)and the like. Note that subpixels which have a function of displaying avariety of colors can be used. Specifically, a subpixel which has afunction of displaying red can be used as the subpixel 502R. Moreover,subpixels which have a function of displaying green, blue, and the likecan be used for the pixel 502.

The subpixel 502R includes the display element 550R, a coloring layer CFwhich has a region overlapping with the display element 550R, and apixel circuit which has a function of supplying electric power to thedisplay element 550R in response to the control signal and the imagesignal. For example, a transistor M0 or a capacitor can be used for thepixel circuit (see FIG. 10B).

In this embodiment, a light-emitting element (an organic EL element) isused as a display element. The display element 550R includes a firstelectrode 551R and a second electrode 552 to which electric power issupplied, and a layer 553 containing a light-emitting organic compoundbetween the first electrode 551R and the second electrode 552.

The first electrode 551R is electrically connected to a source electrodeor a drain electrode of the transistor M0.

The driver circuit SD includes a transistor MD or a capacitor CD. Forexample, a transistor which can be formed in the same process as thetransistor M0 can be used as the transistor MD.

The display module 500 of one embodiment of the present inventionincludes the pixel circuit between the layer 553 containing alight-emitting organic compound and the first substrate 510 and aninsulating layer 521 between the layer 553 containing a light-emittingorganic compound and the pixel circuit.

The display module 500 of one embodiment of the present inventionfurther includes a light-blocking layer BM having an opening in a regionoverlapping with the subpixel 502R.

Furthermore, the display module 500 of one embodiment of the presentinvention includes a functional film 570P which has a region overlappingwith the region 501. For example, a polarizing plate can be used for thefunctional film 570P.

<<Sensing Portion>>

The display module 500 of one embodiment of the present inventionfurther includes a touch sensor including a sensing element.

A control line CL(i) electrically connected to the touch sensor, asignal line ML(j) electrically connected to the touch sensor, a terminalelectrically connected to the control line CL(i), and a second terminalportion 519B electrically connected to the signal line ML(j) areincluded (see FIG. 11A and FIG. 12).

The touch sensor includes a first electrode C1(i) and a second electrodeC2(j) which does not partly overlap with the first electrode C1(i).

The first electrode C1(i) or the second electrode C2(j) includes aconductive film including regions having light-transmitting propertiesin regions overlapping with the pixels 502 or the subpixels 502R.

Alternatively, the first electrode C1(i) or the second electrode C2(j)includes a net-like conductive film having openings 576 in regionsoverlapping with the pixels 502 or the subpixels 502R.

The first electrode C1(i) is electrically connected to the control lineCL(i) extended in a row direction (a direction indicated by an arrow Rin FIG. 12). Note that the control line CL(i) has a function ofsupplying a control signal.

The second electrode C2(j) is electrically connected to the signal lineML(j) extended in a column direction (a direction indicated by an arrowC in FIG. 12). Note that the signal line ML(j) has a function ofsupplying a sensor signal (see FIG. 12).

The control line CL(i) includes a wiring BR(i,j). In the wiring BR(i,j),the control line CL(i) intersects with the signal line ML(j). Aninsulating layer 571 is provided between the wiring BR(i,j) and thesignal line ML(j) (see FIG. 11B). Thus, a short circuit between thewiring BR(i,j) and the signal line ML(j) can be prevented.

Note that the display module 500 including the touch sensor can bereferred to as an input/output module or a touch panel module.

The display module 500 can sense a nearby object and supply positionaldata of the nearby object or sensing data including the track or thelike. For example, a user of the display module 500 can make a varietyof gestures (e.g., tap, drag, swipe, and pinch in) to be sensed usinghis/her finger or the like that approaches or is in contact with thedisplay module 500 as a pointer.

In addition, the user of the display module 500 can give a variety ofoperation instructions to an arithmetic device with the display module500. For example, the display module 500 can sense a gesture, anarithmetic device can determine whether or not the sensing data suppliedfrom the display module 500 satisfies a predetermined condition on thebasis of a program or the like, and a predetermined instruction can beexecuted in the case where the condition is satisfied.

Individual components included in the display module 500 will bedescribed below. Note that these components cannot be clearlydistinguished from each Other and one component also serves as anothercomponent or includes part of another component in some cases.

For example, the display module 500 serves as a sensing panel or adisplay panel as well as a touch panel.

<<First Substrate>>

A variety of substrates can be used as the first substrate 510.

For example, a material similar to the material which can be used forthe first substrate 101 described in Embodiment 1 can be used.

In this specification and the like, a transistor can be formed using anyof a variety of substrates or any of a variety of bases, for example.The type of the substrate is not limited to a certain type. Examples ofthe substrate include a semiconductor substrate (e.g., a single crystalsubstrate or a silicon substrate), an SOI substrate, a glass substrate,a quartz substrate, a plastic substrate, a sapphire glass substrate, ametal substrate, a stainless steel substrate, a substrate includingstainless steel foil, a tungsten substrate, a substrate includingtungsten foil, a flexible substrate, an attachment film, paper includinga fibrous material, a base film, and the like. As an example of a glasssubstrate, a barium borosilicate glass substrate, an aluminoborosilicateglass substrate, a soda lime glass substrate, and the like can be given.Examples of the flexible substrate, the attachment film, the base film,and the like are substrates of plastics typified by polyethyleneterephthalate (PET), polyethylene naphthalate (PEN), polyether sulfone(PES), and polytetrafluoroethylene (PTFE). Another example is asynthetic resin such as acrylic. Furthermore, polypropylene, polyester,polyvinyl fluoride, and polyvinyl chloride can be given as examples.Other examples are polyamide, polyimide, aramid, epoxy, an inorganicvapor deposition film, paper, and the like. Specifically, the use ofsemiconductor substrates, single crystal substrates, SOI substrates, orthe like enables the manufacture of small-sized transistors with a smallvariation in characteristics, size, shape, or the like and with highcurrent capability. A circuit using such transistors achieves lowerpower consumption of the circuit or higher integration of the circuit.

A peeling layer is provided between the substrate and the transistor,and part or all of a semiconductor device is provided thereover. Then,the transistor can be separated from the substrate and transferred ontoanother substrate. In such a case, the transistor can also betransferred even onto a substrate having low heat resistance or aflexible substrate. For the above peeling layer, a stack includinginorganic films, which are a tungsten film and a silicon oxide film, ora structure in which an organic resin film of polyimide or the like isformed over a substrate can be used, for example.

In other words, after the transistor is formed using a substrate, thetransistor may be transferred to another substrate so as to bepositioned over another substrate. Examples of a substrate to which atransistor is transferred include, in addition to the above substrateover which the transistor can be formed, a paper substrate, a cellophanesubstrate, an aramid film substrate, a polyimide film substrate, a stonesubstrate, a wood substrate, a cloth substrate (including a naturalfiber (e.g., silk, cotton, or hemp), a synthetic fiber (e.g., nylon,polyurethane, or polyester), a regenerated fiber (e.g., acetate, cupra,rayon, or regenerated polyester), and the like), a leather substrate, arubber substrate, and the like. When such a substrate is used, atransistor with excellent characteristics or a transistor with low powerconsumption can be formed, a device with high durability can be formed,high heat resistance can be provided, or reduction in weight orthickness can be achieved.

<<Second Substrate>>

A variety of substrates can be used as the second substrate 570.

For example, a material similar to the material which can be used forthe second substrate 102 described in Embodiment 1 can be used.

<<First Adhesive Layer, Second Adhesive Layer>>

A variety of materials can be used as the first adhesive layer 506 orthe second adhesive layer 507.

For example, a material similar to the material which can be used forthe first adhesive layer 106 described in Embodiment 1 can be used.

<<First Layer, Second Layer>>

The first layer 503 includes the insulating layer, the transistor M0,the transistor MD, the capacitor CD, the display element 550R, the thirdpartition 528, the spacer KB, and the like.

The spacer KB can be regarded as a projecting portion of the first layer503, here.

The second layer 504 includes the insulating layer, the coloring layerCF, the light-blocking layer BM, the sensing element, and the like.

A surface of the first layer 503 which faces the first substrate 510 isreferred to as a first surface and a surface of the second layer 504which faces the second substrate 570 is referred to as a second surface.

A distance 533, which is between the first surface and the secondsurface in a region 531 including the spacer KB, is longer than adistance 534, which is between the first surface and the second surfacein a region 532 around the region 531.

The first layer 503 and the second layer 504 are partly in contact witheach other in the region 531 including the spacer KB. The first layer503 and the second layer 504 are preferably in contact with each otherin the region including the light-emitting element and the coloringlayer CF.

According to the present invention, the gap between the light-emittingelement and the coloring layer CF is eliminated or partly narrowed ascompared to that in the conventional structure such as a structure inwhich an adhesive is filled between the light-emitting element and thecoloring layer CF. No gap or a partly narrowed gap as compared to thatin the conventional structure improves the viewing angle of the displaymodule 500, reduces the light leakage from the adjacent pixel, andincreases the reliability.

<<Transistor>>

In this specification and the like, for example, transistors with avariety of structures can be used as a transistor, without limitation toa certain type. For example, a transistor including a single crystalsilicon or a non-single-crystal semiconductor film typified by amorphoussilicon, polycrystalline silicon, microcrystalline (also referred to asmicrocrystal, nanocrystal, or semi-amorphous) silicon, or the like canbe used as a transistor. Alternatively, a thin film transistor (TFT)formed using the above semiconductor as thin films can be used. In thecase of using the TFT, there are a variety of advantages. For example,since the TFT can be formed at temperature lower than that of the caseof using single crystal silicon, manufacturing cost can be reduced or amanufacturing apparatus can be made larger. Since the manufacturingapparatus can be made larger, the TFT can be formed using a largesubstrate. Therefore, many display devices can be formed at the sametime at low cost. In addition, a substrate having low heat resistancecan be used because of low manufacturing temperature. Therefore, thetransistor can be formed using a light-transmitting substrate.Alternatively, transmission of light in a display element can becontrolled by using the transistor formed using the light-transmittingsubstrate. Alternatively, part of a film included in the transistor cantransmit light because of a small thickness of the transistor.Therefore, the aperture ratio can be improved.

Note that when a catalyst (e.g., nickel) is used in the case of formingpolycrystalline silicon, crystallinity can be further improved and atransistor having excellent electric characteristics can be formed.Accordingly, a gate driver circuit (e.g., a scan line driver circuit), asource driver circuit (e.g., a signal line driver circuit), and a signalprocessing circuit (e.g., a signal generation circuit, a gammacorrection circuit, or a DA converter circuit) can be formed using thesame substrate.

Note that when a catalyst (e.g., nickel) is used in the case of formingmicrocrystalline silicon, crystallinity can be further improved and atransistor having excellent electric characteristics can be formed. Inthat case, crystallinity can be improved by just performing heattreatment without performing laser irradiation. Accordingly, a gatedriver circuit and part of a source driver circuit (e.g., an analogswitch) can be formed using the same substrate. Note that when laserirradiation for crystallization is not performed, unevenness incrystallinity of silicon can be suppressed. Therefore, high-qualityimages can be displayed. Note that it is possible to formpolycrystalline silicon or microcrystalline silicon without a catalyst(e.g., nickel).

Note that although the crystallinity of silicon is preferably improvedto polycrystal, microcrystal, or the like in the whole panel, thepresent invention is not limited to this. The crystallinity of siliconmay be improved only in part of the panel. Selective increase incrystallinity can be achieved by selective laser irradiation or thelike. For example, only a peripheral circuit region excluding pixels maybe irradiated with laser light. Alternatively, only a region of a gatedriver circuit, a source driver circuit, or the like may be irradiatedwith laser light. Alternatively, only part of a source driver circuit(e.g., an analog switch) may be irradiated with laser light.Accordingly, the crystallinity of silicon can be improved only in aregion in which a circuit needs to be operated at high speed. Because apixel region is not particularly needed to be operated at high speed,even if crystallinity is not improved, the pixel circuit can be operatedwithout any problem. Thus, a region whose crystallinity is improved issmall, so that manufacturing steps can be shortened. This can increasethroughput and reduce manufacturing cost. Alternatively, since thenumber of necessary manufacturing apparatus is small, manufacturing costcan be reduced.

Examples of the transistor include a transistor including a compoundsemiconductor (e.g., SiGe or GaAs) or an oxide semiconductor (e.g.,Zn—O, In—Ga—Zn—O, In—Zn—O, In—Sn—O (ITO), Sn—O, Ti—O, Al—Zn—Sn—O (AZTO),or In—Sn—Zn—O) and a thin film transistor including a thin film of sucha compound semiconductor or an oxide semiconductor. Becausemanufacturing temperature can be lowered, such a transistor can beformed at room temperature, for example. The transistor can thus beformed directly on a substrate having low heat resistance, such as aplastic substrate or a film substrate. Note that such a compoundsemiconductor or an oxide semiconductor can be used not only for achannel portion of the transistor but also for other applications. Forexample, such a compound semiconductor or an oxide semiconductor can beused for a wiring, a resistor, a pixel electrode, a light-transmittingelectrode, or the like. Such an element can be formed at the same timeas the transistor; thus, cost can be reduced.

Note that a transistor formed by an ink-jet method or a printing methodcan be used as the transistor, for example. Accordingly, such atransistor can be formed at room temperature or at a low vacuum, or canbe formed using a large substrate. Thus, the transistor can be formedwithout using a mask (reticle), which enables the layout of thetransistor to be easily changed. Alternatively, the transistor can beformed without using a resist, leading to reductions in material costand the number of steps. Further, since a film can be formed only in aportion where the film is needed, a material is not wasted as comparedwith the case of employing a manufacturing method by which etching isperformed after the film is formed over the entire surface, so that thecost can be reduced.

Note that a transistor including an organic semiconductor or a carbonnanotube can be used as the transistor, for example. Thus, such atransistor can be formed over a flexible substrate. A device including atransistor which includes an organic semiconductor or a carbon nanotubecan be shock-resistant.

Note that transistors with a variety of different structures can be usedas the transistor. For example, a MOS transistor, a junction transistor,a bipolar transistor, or the like can be used as the transistor. Byusing a MOS transistor as the transistor, the size of the transistor canbe reduced. Thus, a number of transistors can be mounted. By using abipolar transistor as the transistor, a large amount of current canflow. Thus, a circuit can be operated at high speed. Note that a MOStransistor and a bipolar transistor may be formed over one substrate, inwhich case reductions in power consumption and size, high-speedoperation, and the like can be achieved.

<<Wiring, Terminal>>

The wiring or the terminal has a function of supplying an image signal,a control signal, a sensor signal, a power supply potential, or thelike. The wiring includes the control line CL(i), the signal line ML(j),and the like.

A variety of conductive materials can be used for the wiring or theterminal.

For example, an inorganic conductive material, an organic conductivematerial, a metal material, a conductive ceramic material, or the likecan be used for the wiring or the terminal.

Specifically, a metal element selected from aluminum, gold, platinum,silver, copper, chromium, tantalum, titanium, molybdenum, tungsten,nickel, iron, cobalt, palladium, and manganese, or the like can be usedfor the wiring or the terminal. Alternatively, an alloy including any ofthe above-described metal elements, or the like can be used for thewiring or the terminal. Further alternatively, an alloy including any ofthe above-described metal elements in combination, or the like can beused for the wiring or the terminal. In particular, an alloy of copperand manganese is suitably used in microfabrication with the use of a wetetching method.

Specifically, a two-layer structure in which a titanium film is stackedover an aluminum film, a two-layer structure in which a titanium film isstacked over a titanium nitride film, a two-layer structure in which atungsten film is stacked over a titanium nitride film, a two-layerstructure in which a tungsten film is stacked over a tantalum nitridefilm or a tungsten nitride film, a three-layer structure in which atitanium film, an aluminum film, and a titanium film are stacked in thisorder, or the like can be used.

Specifically, a conductive oxide such as indium oxide, ITO, indium zincoxide, zinc oxide, or zinc oxide to which gallium is added can be usedfor the wiring or the terminal.

Specifically, a film including graphene or graphite can be used for thewiring or the terminal.

For example, a film including graphene oxide is formed and is reduced,so that a film including graphene can be formed. As a reducing method, amethod using heat, a method using a reducing agent, or the like can beemployed.

Specifically, a conductive high molecule can be used for the wiring orthe terminal.

<<Display Unit>>

A display unit 580R includes the display element 550R or the coloringlayer CF which transmits at least part of light.

A spacer KB is provided between the third partition 528 and thelight-blocking layer BM. The spacer KB has a function of controlling adistance between the display element 550R and the coloring layer CF.

For example, a layer containing a material such as a pigment or a dye, acolor filter, or the like can be used as the coloring layer CF. Thus, itis possible to provide a display unit which displays a specific color oflight transmitted through the coloring layer CF.

A microcavity structure which includes a reflective film and asemi-transmissive and semi-reflective film can be used for the displayunit 580R.

Specifically, a light-emitting element including a reflective conductivefilm as one electrode, a semi-transmissive and semi-reflectiveconductive film as the other electrode, and a layer containing alight-emitting organic compound between the two electrodes can be usedfor the display unit 580R.

For example, a microresonator for extracting red light efficiently and acoloring layer which transmits red light may be used in the display unit580R for displaying red, a microresonator for extracting green lightefficiently and a coloring layer which transmits green light may be usedin a display unit for displaying green, a microresonator for extractingblue light efficiently and a coloring layer which transmits blue lightmay be used in a display unit for displaying blue light, or amicroresonator for extracting yellow light efficiently and a coloringlayer which transmits yellow light may be used in a display unit fordisplaying yellow light.

<<Display Element>>

Display media whose contrast, luminance, reflectance, transmittance, orthe like is changed by an electrical or/and magnetic effect can be usedas a display element 550R.

For example, an organic EL element which emits white light can be used.

For example, a plurality of organic EL elements which emit light ofdifferent colors can be used.

For example, the third partition 528 for division into a plurality ofdisplay elements can be used. For example, an insulating material can beused for the third partition 528. Specifically, an insulating inorganicoxide material, a resin, or the like can be used.

As the display element, an electroluminescence (EL) element (e.g., an ELelement including organic and inorganic materials, an organic ELelement, or an inorganic EL element), an LED (e.g., a white LED, a redLED, a green LED, or a blue LED), a transistor (a transistor which emitslight depending on current), an electron emitter, a liquid crystalelement, electronic ink, an electrophoretic element, a grating lightvalve (GLV), a plasma display panel (PDP), a display element using microelectro mechanical systems (MEMS), a digital micromirror device (DMD), adigital micro shutter (DMS), MIRASOL (registered trademark), aninterferometric modulator (IMOD) element, a MEMS shutter displayelement, an optical-interference-type MEMS display element, anelectrowetting element, a piezoelectric ceramic display, or the like canbe used, for example.

<<First Electrode>>

A conductive material can be used for the first electrode 551R. Inparticular, a material which efficiently reflects light emitted from thelayer 553 containing a light-emitting organic compound is preferable.

For example, an inorganic conductive material, an organic conductivematerial, a metal material, a conductive ceramic material, or the likecan be used. Note that a structure of a single layer or stacked layersincluding a material selected from the above materials can be used, forexample.

Specifically, a metal element selected from aluminum, gold, platinum,silver, chromium, tantalum, titanium, molybdenum, tungsten, nickel,iron, cobalt, palladium, and manganese; an alloy including any of theabove-described metal elements; an alloy including any of theabove-described metal elements in combination; or the like can be used.

In particular, silver, aluminum, and an alloy including any of them arepreferable because of their high reflectance with respect to visiblelight.

Alternatively, a conductive oxide such as indium oxide, ITO, indium zincoxide, zinc oxide, or zinc oxide to which gallium is added can be used.

Alternatively, graphene or graphite can be used. The film includinggraphene can be formed by reducing a film including film-shaped grapheneoxide, for example. As a reducing method, a method using heat, a methodusing a reducing agent, or the like can be employed.

Alternatively, a conductive high molecule can be used.

<<Second Electrode>>

A light-transmitting conductive material can be used for the secondelectrode 552.

For example, a material which can be used for the first electrode 551Ris made thin enough to have a light-transmitting property to be used forthe second electrode 552. Specifically, a metal thin film with athickness greater than or equal to 5 nm and less than or equal to 30 nmcan be used.

Note that a single layer or stacked layers can include the material.Specifically, a stack of silver with a thickness greater than or equalto 5 nm and less than or equal to 30 nm and a metal oxide layerincluding indium and tin can be used.

<<Layer Containing Light-Emitting Organic Compound>>

A layer containing an organic compound which emits fluorescence or lightobtained through a triplet excited state can be used as the layer 553containing a light-emitting organic compound.

A structure of a single layer or stacked layers can be used for thelayer 553 containing a light-emitting organic compound.

For example, a layer including a material with a higher hole-transportproperty than an electron-transport property, a layer including amaterial with a higher electron-transport property than a hole-transportproperty, or the like can be used.

For example, a plurality of layers 553 containing light-emitting organiccompounds with different compositions can be used in one display panel.For example, the display panel can include a layer containing a redlight-emitting organic compound, a layer containing a greenlight-emitting organic compound, and a layer containing a bluelight-emitting organic compound.

A light-emitting element includes a light-emitting substance between apair of electrodes. Examples of the light-emitting substance include amaterial which can convert the singlet excitation energy into lightemission (e.g., a fluorescent material) and a material which can convertthe triplet excitation energy into light emission (e.g., aphosphorescent material or a thermally activated delayed fluorescence(TADF) material).

The above-described light-emitting substance has a peak of an emissionspectrum in at least any one of blue (greater than or equal to 420 nmand less than 500 nm), green (greater than or equal to 500 nm and lessthan 550 nm), yellow (greater than or equal to 550 nm and less than 600nm), and red (greater than or equal to 600 nm and less than or equal to740 nm) wavelength ranges. Note that the above-described light-emittingsubstance can be formed by an evaporation method (including a vacuumevaporation method), an ink-jet method, a coating method, gravureprinting, or the like.

Examples of a substance which has a peak of an emission spectrum in ablue wavelength range include fluorescent materials containing a pyrenederivative, an anthracene derivative, a triphenylene derivative, afluorene derivative, a carbazole derivative, a dibenzothiophenederivative, a dibenzofuran derivative, a dibenzoquinoxaline derivative,a quinoxaline derivative, a pyridine derivative, a pyrimidinederivative, a phenanthrene derivative, a naphthalene derivative, and thelike. A pyrene derivative is particularly preferable because it has ahigh emission quantum yield.

As the substance which has a peak of an emission spectrum in a bluewavelength range, an iridium-, rhodium-, or platinum-basedorganometallic complex or a metal complex can be used for example; inparticular, an organoiridium complex such as an iridium-basedortho-metalated complex is preferable. As an ortho-metalated ligand, a4H-triazole ligand, a 1H-triazole ligand, an imidazole ligand, apyridine ligand, and the like can be given. Examples of the substancewhich has a peak of an emission spectrum in a blue wavelength rangeincludes an organometallic iridium complex which includes an iridiummetal, a ligand coordinated to the iridium metal, and a substituentbonded to the ligand, and in which the substituent is a bridged cyclichydrocarbon group (e.g., an adamantyl group or a norbornyl group) whosemass number is greater than or equal to 90 and less than 200. Moreover,the above-described ligand is preferably a nitrogen-containingfive-membered heterocyclic skeleton (e.g., an imidazole skeleton or atriazole skeleton). When a substance including the above-describednitrogen-containing five-membered heterocyclic skeleton is used for alight-emitting layer, a light-emitting element having high emissionefficiency or high reliability can be obtained.

As the substances which have peaks of emission spectra in green, yellow,and red wavelength ranges, an iridium-, rhodium-, or platinum-basedorganometallic complex or a metal complex can be used; in particular, anorganoiridium complex such as an iridium-based ortho-metalated complexis preferable. As an ortho-metalated ligand, a 4H-triazole ligand, a1H-triazole ligand, an imidazole ligand, a pyridine ligand, a pyrimidineligand, a pyrazine ligand, an isoquinoline ligand, and the like can begiven. As the metal complex, a platinum complex having a porphyrinligand, and the like can be given. Furthermore, the organometalliciridium complex having a pyrazine ligand is preferable because red lightemission with favorable chromaticity can be provided. Moreover, theorganometallic iridium complex having a pyrimidine ligand has highreliability or emission efficiency and is thus preferable.

The light-emitting element may include a substance with a carrier(electron or hole)-transport property in addition to the above-describedlight-emitting substance. Besides the above-described light-emittingsubstance, an inorganic compound or a high molecular compound (e.g., anoligomer, a dendrimer, or a polymer) may be included in thelight-emitting element.

<<Flexible Printed Circuit>>

Flexible printed circuits of a variety of structures can be used for thefirst flexible printed circuit FPC1 or the second flexible printedcircuit FPC2.

The flexible printed circuit includes a wiring electrically connected tothe terminal, a base which supports the wiring, and a coating layerwhich has a region overlapping with the wiring. The wiring includes aregion between the base and the coating layer and a region notoverlapping with the coating layer.

Note that the region of the wiring which does not overlap with thecoating layer is used for a terminal of the flexible printed circuit.

<<Sensing Element, Sensing Circuit>>

A sensing element for sensing capacitance, illuminance, magnetic force,a radio wave, pressure, or the like and supplying a signal based on thesensed physical quantity can be used for the functional layer.

For example, a conductive film, a photoelectric conversion element, amagnetic sensing element, a piezoelectric element, a resonator, or thelike can be used as the sensing element.

For example, a sensing circuit having a function of supplying a signalwhich varies on the basis of the parasitic capacitance of a conductivefilm can be used for the functional layer. Thus, a finger or the likewhich approaches the conductive film in the air can be sensed withchange in capacitance.

Specifically, a control signal is supplied to the first electrode C1(i)with the control line CL(i). The potential of the second electrode C2(j) which changes on the basis of the supplied control signal and thecapacitance is obtained with the signal line ML(j) and can be suppliedas a sensor signal.

For example, a circuit including a capacitor one electrode of which isconnected to a conductive film can be used as a sensing circuit.

The sensing element may be formed by depositing a film for forming thesensing element over the second substrate 570 and processing the film.

Alternatively, the display module 500 may be formed in such a mannerthat part of the display module 500 is formed over another base, and thepart is transferred to the second substrate 570.

<<Functional Film>>

A variety of functional films can be used for the functional film 570P.

For example, an anti-reflective film or the like can be used as thefunctional film 570P. Specifically, an anti-glare coat, a circularlypolarizing plate, or the like can be used. Thus, the intensity ofoutside light reflected when the display module 500 is used outdoors canbe reduced, for example. Moreover, glare of lighting can be suppressedwhen used indoors, for example.

For example, a ceramic coat layer or a hard coat layer can be used asthe functional film 570P. Specifically, a ceramic coat layer containingaluminum oxide, silicon oxide, or the like, a UV cured resin layer, orthe like can be used.

This embodiment can be combined with any of the other embodiments inthis specification as appropriate.

Embodiment 4

In this embodiment, a structure of a data processor of one embodiment ofthe present invention will be described with reference to FIGS. 13A-1,13A-2, 13A-3, 13B-1, 13B-2, 13C-1, and 13C-2.

FIGS. 13A-1, 13A-2, 13A-3, 13B-1, 13B-2, 13C-1, and 13C-2 are views of adata processor of one embodiment of the present invention.

FIGS. 13A-1 to 13A-3 are each a projection view of a data processor4000A of one embodiment of the present invention.

FIGS. 13B-1 and 13B-2 are each a projection view of a data processor4000B of one embodiment of the present invention.

FIGS. 13C-1 and 13C-2 are a top view and a bottom view of a dataprocessor 4000C of one embodiment of the present invention.

<<Data Processor A>>

The data processor 4000A includes an input/output portion 4120 and ahousing 4101 which supports the input/output portion 4120 (see FIGS.13A-1 to 13A-3).

The input/output portion 4120 includes a functional panel of oneembodiment of the present invention. For example, the functional paneldescribed in Embodiment 3 can be used for the input/output portion 4120.

The data processor 4000A further includes an arithmetic unit, a memoryunit which stores a program to be executed by the arithmetic unit, and apower source such as a battery which supplies electric power for drivingthe arithmetic unit.

Note that the housing 4101 houses the arithmetic unit, the memory unit,the battery, and the like.

The data processor 4000A can display information on its side surfaceand/or top surface.

A user of the data processor 4000A can give operation instructions byusing a finger in contact with the side surface and/or top surface.

<<Data Processor B>>

The data processor 4000B includes a housing 4101 (see FIGS. 13B-1 and13B-2). The housing 4101 includes a belt-like portion 4101 b which canbe fastened with a buckle.

The housing 4101 supports an input/output portion 4120 and aninput/output portion 4120 b.

The input/output portion 4120 or the input/output portion 4120 bincludes a functional panel of one embodiment of the present invention.For example, the functional panel described in Embodiment 3 can be usedfor the input/output portion 4120.

The data processor 4000B further includes an arithmetic unit, a memoryunit which stores a program to be executed by the arithmetic unit, and apower source such as a battery which supplies electric power for drivingthe arithmetic unit.

The housing 4101 houses the arithmetic unit, the memory unit, thebattery, and the like.

The data processor 4000B can display information on the input/outputportion 4120 or the input/output portion 4120 b.

A user of the data processor 4000B can give operation instructions byusing a finger in contact with the input/output portion 4120 or theinput/output portion 4120 b.

<<Data Processor C>>

The data processor 4000C includes an input/output portion 4120 and ahousing 4101 which supports the input/output portion 4120 (see FIGS.13C-1 and 13C-2).

The input/output portion 4120 includes a functional panel of oneembodiment of the present invention. For example, the functional paneldescribed in Embodiment 3 can be used for the input/output portion 4120.

The data processor 4000C further includes an arithmetic unit, a memoryunit which stores a program to be executed by the arithmetic unit, and apower source such as a battery which supplies electric power for drivingthe arithmetic unit.

Note that the housing 4101 houses the arithmetic unit, the memory unit,the battery, and the like.

The housing 4101 includes a region 4101 c which can be bent.Accordingly, the data processor 4000C can be folded in two at the region4101 c.

Note that this embodiment can be combined with any of the otherembodiments in this specification as appropriate.

This application is based on Japanese Patent Application serial No.2014-266983 filed with Japan Patent Office on Dec. 29, 2014, the entirecontents of which are hereby incorporated by reference.

What is claimed is:
 1. A functional panel comprising: a first substrate;a second substrate; a first layer; a second layer; a sealing portion;and a first adhesive layer, wherein the sealing portion is between thefirst layer and the second layer, wherein the first adhesive layer isbetween the first layer and the first substrate, wherein the secondsubstrate includes a region in contact with the second layer, whereinthe first layer includes a first surface facing the first substrate,wherein the second layer includes a second surface in contact with thesecond substrate, and wherein a plurality of regions with differentdistances between the first surface and the second surface are provided.2. A functional panel comprising: a first substrate; a second substrate;a first layer; a second layer; a third layer; a sealing portion; and afirst adhesive layer, wherein the sealing portion is between the firstlayer and the second layer, wherein the first adhesive layer is betweenthe first layer and the first substrate, wherein the third layer isbetween the second layer and the second substrate, wherein the firstlayer includes a first surface facing the first substrate, wherein thesecond layer includes a second surface facing the second substrate, andwherein a plurality of regions with different distances between thefirst surface and the second surface are provided.
 3. A functional panelcomprising: a first substrate; a second substrate; a first layer; asecond layer; a sealing portion; a first adhesive layer, and a secondadhesive layer, wherein the sealing portion is between the first layerand the second layer, wherein the first adhesive layer is between thefirst layer and the first substrate, wherein the second adhesive layeris between the second layer and the second substrate, wherein the firstlayer includes a first surface facing the first substrate, wherein thesecond layer includes a second surface facing the second substrate, andwherein a plurality of regions with different distances between thefirst surface and the second surface are provided.
 4. The functionalpanel according to any one of claims 1 to 3, wherein at least one of thefirst layer and the second layer includes a projecting portion, andwherein the distance between the first surface and the second surface ina region including the projecting portion is longer than the distancebetween the first surface and the second surface in another region. 5.The functional panel according to any one of claims 1 to 3, wherein thefirst layer includes a region in contact with the second layer.
 6. Thefunctional panel according to any one of claims 1 to 3, wherein at leastone of the first layer and the second layer includes a functionalelement.
 7. The functional panel according to claim 6, wherein thefunctional element is a transistor, an organic electroluminescentelement, or a micro electro mechanical systems (MEMS).
 8. The functionalpanel according to any one of claims 1 to 3, wherein pressure in a spacesurrounded by the first layer and the second layer or by the firstlayer, the second layer, and the sealing portion is lower thanatmospheric pressure.
 9. The functional panel according to claim 8,wherein a pressure in the space is lower than or equal to 10 Pa.
 10. Amethod for manufacturing a functional panel, comprising the steps of:preparing a first formation substrate provided with a first layer with afirst peeling layer therebetween, and a second substrate including aregion in contact with a second layer; bonding the first layer and thesecond layer to each other with a sealing portion in a reduced-pressureatmosphere; peeling the first peeling layer and the first layer in anatmosphere with a pressure higher than that of the reduced-pressureatmosphere; and bonding the first layer and a first substrate to eachother with a first adhesive layer.
 11. A method for manufacturing afunctional panel, comprising the steps of: preparing a first formationsubstrate provided with a first layer with a first peeling layertherebetween, and a second substrate provided with a second layer with athird layer therebetween; bonding the first layer and the second layerto each other with a sealing portion in a reduced-pressure atmosphere;peeling the first peeling layer and the first layer in an atmospherewith a pressure higher than that of the reduced-pressure atmosphere; andbonding the first layer and a first substrate to each other with a firstadhesive layer.
 12. A method for manufacturing a functional panel,comprising the steps of: preparing a first formation substrate providedwith a first layer with a first peeling layer therebetween, and a secondformation substrate provided with a second layer with a second peelinglayer therebetween; bonding the first layer and the second layer to eachother with a sealing portion in a reduced-pressure atmosphere; peelingthe first peeling layer and the first layer in an atmosphere with apressure higher than that of the reduced-pressure atmosphere; bondingthe first layer and a first substrate to each other with a firstadhesive layer; peeling the second peeling layer and the second layer inan atmosphere with a pressure higher than that of the reduced-pressureatmosphere; and bonding the second layer and a second substrate to eachother with a second adhesive layer.
 13. The method for manufacturing thefunctional panel according to any one of claims 10 to 12, wherein thereduced-pressure atmosphere is lower than or equal to 10 Pa.
 14. Themethod for manufacturing the functional panel according to any one ofclaims 10 to 12, wherein the pressure higher than that of thereduced-pressure atmosphere is atmospheric pressure.